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Kurzfassung

Researchers from Goethe University Frankfurt am Main have developed a portfolio of silylene-based chemistry allowing for the synthesis of defined oligo- and polysilanes from trichlorosilane and hexachlorodisilane. The combination of the new technologies offers an alternative to the conventional energy-consuming silicon chemistry and access to new compounds.

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Hintergrund

Silicon represents the essential material in elec-tronic applications, as both the semiconductor and the photovoltaic industry rely on silicon-based devices. Typically, oligo- or polysilanes are used as precursors for vapor deposition dur-ing the manufacturing process. The defined syn-thesis of these compounds is associated with high energy demands, as usually plasma or thermal processes are involved.

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Bilder & Videos

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Lösung

The technologies are based on the finding that formal sylilene fragments [:SiCl2] can be gener-ated from trichlorosilane and hexachlorodisilane in the presence of ammonium (R4NCl) or phos-phonium chloride (R4PCl). These fragments are utilized as building blocks to construct perhalogenated higher silyl anions. By varying the reaction conditions, linear, cyclic or cagelike oligo- and polysilyl anions are ob-tained. Especially, length/size and branching of the polysilyl anions can be specifically tuned. Hence, defined polysilyl anions are accessible through simple and energy-saving one-step synthesis. cyclo-Hexasilane [20]Silafullerane Silylcarbanions

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Vorteile

Defined products Material properties easily and selectively tunable High yields Cheap reagents Low energy demands

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Anwendungsbereiche

The new silanes can be used in various con-texts, but are especially suited for thin film and vapor deposition of amorphous silicon e.g. for solar energy components. The silylcarbanions exhibit defined Si/C ratios. Hence, they are especially suited for manufac-turing of defined silicon carbides. After hydroly-sis, the branched C(SiCl3)3 can be employed as crosslinker in silicones.

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Service

Licensing or assignment of the technology is possible as well as a cooperation for further development of the technologies.